ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
Dec 5, 2018
ieee.org
The full EUV optical light path - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
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📣 Milestone moment for Intel... Europe's first high volume EUV scanner has arrived! This system, made by Dutch manufacturer ASML, is arguably the most complicated piece of machinery humans have ever built and it heralds an important moment for our new €17 billion fab development in Ireland. https://intel.ly/37msdgP | Intel
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【ASML EUV微影設備｜雙晶圓平台處理技術⚙️】 ASML TWINSCAN曝光機中的晶圓平台（Wafer Stage）是微影設備中關鍵的定位模組（Positioning Module），在系統設計上整合機械電子學、光學設計及量測學（包含量測、數據處理及控制）。雙晶圓平台能在同一時間移動兩片矽晶圓：其中右邊的晶圓曝光於EUV極紫外光下，將電路設計圖影像（Pattern）刻在晶圓上；左邊的晶圓同時由機台的量測儀器優化其準確度（Alignment）。兩個平台交替執行微影和量測功能，並以電磁的方式移動，在無摩擦力的作用下能加速至7G❗️ 這就是ASML的微影系統如何在晶片量產時得以兼顧準確性及生產速度的關鍵。⚡️ #ASML #EUV #WaferStage | ASML
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【ASML EUV微影設備｜雙晶圓平台處理技術⚙️】 ASML TWINSCAN …
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Press Kit: High NA EUV at Intel
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