(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...
Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...
A review of Ion Beam technology is presented in this paper. The key applications and benefits of using ion beam technology for etching processes in comparison to technology such as plasma etching will ...
Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif., ...
Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
SHANGHAI, March 13, 2018 /PRNewswire/ -- This week at SEMICON China, Advanced Micro-Fabrication Equipment Inc. (AMEC) formally unveiled the Primo nanova® system (nanova) - the company's first ...
FREMONT, Calif., March 03, 2020 (GLOBE NEWSWIRE) -- Lam Research Corp. (Nasdaq: LRCX) today announced the launch of a completely transformed plasma etch technology and system solution, designed to ...
FREMONT, CA--(Marketwired - July 14, 2015) - Mattson Technology, Inc. (MTSN), a leading supplier of advanced wafer fabrication equipment used by semiconductor manufacturers, today announced that it ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
As feature sizes continue to shrink and new device architectures are introduced, the IC industry will require new breakthroughs. In fact, feature dimensions will soon have tolerances that are on the ...
CONCORD, Calif.--(BUSINESS WIRE)--Nordson Electronics Solutions, a division of Nordson Corporation (NASDAQ:NDSN), a global leader in plasma processing technology, introduces the MARCH MegaVIA™ Plasma ...
Applied Materials Inc. says it can do away with the middle etch stop layer in copper dual damascene/low k stacks and provide better critical dimension (CD) control with its new EnTek Centura chamber.
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