It's a mistake to assume wafer clamp rings have to polyimide. Several other work about as well. Silicon wafers aren't the only things that lose material in the various etching steps of IC ...

(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

FREMONT, CA--(Marketwired - July 14, 2015) - Mattson Technology, Inc. (MTSN), a leading supplier of advanced wafer fabrication equipment used by semiconductor manufacturers, today announced that it ...

Deep inside your smartphone are a handful of interesting miniature electromechanical devices. The accelerometer is a MEMS device, and was produced with some of the most impressive industrial processes ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

Plasma Etch Inc. has released its fully automated plasma cleaner, the PE-25-jw. The unit, priced at $6,900, is equipped with a programmable logic controller and a single gas channel, with an option of ...

MUNICH, Germany — Asyntis GmbH, a two-year old supplier of plasma etch equipment for semiconductor manufacturing, has raised 4 million euro (about $4.35 million) in a second round of financing that ...