TSMC extends dominance of semiconductors with 56% share of global lithography systems
Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the ...
Digi Times3d
TSMC now reportedly operates over half of global EUVs, weighs high-NA adoption
Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the ...
Why can’t light microscopes see inside cells?
In the late 1870s and early 1880s, a German engineer and physicist named Ernst Karl Abbe found a formula that connected the ...
The Register on MSN8d
TSMC prioritizing high-NA EUV scanners for R&D
High-NA EUV scanners are advanced lithography machines that use extreme ultraviolet light to etch very fine, dense patterns ...
TechNode11d
TSMC to receive first High NA EUV lithography machine by end of year
TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography ...
PhoneArena9d
ASML is selling the equipment that will take chips to the 1nm node
Intel, which promised to take back process node leadership in 2025 from TSMC and Samsung Foundry, was the first to purchase the new $400 million high-NA EUV machine which increases the numerical ...