Tom's Hardware on MSN
Intel installs industry's first commercial high-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
Morning Overview on MSN
ASML’s top EUV tool is now key to Intel’s comeback plan
Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...
Former ASML employees in China have contributed to a "Manhattan Project" to build their own EUV lithography machines. Should ...
China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They ...
Restricted chipmaking tools are being retrofitted to make advanced AI chips, exposing cracks in US-led export controls ...
Upgraded ASML kit keeps seven-nanometre production alive China’s chip industry is outsmarting Western export controls as it ...
ASML (NASDAQ:ASML), the prominent Dutch semiconductor equipment manufacturer, has experienced a stock drop of nearly 5% over the past week, remaining down by 11% in the last month due to trade ...
China just built an historical chipmaking prototype in total secrecy. From EUV reverse-engineering to 2nm patents, here is ...
ASML has been recovering from the DeepSeek triggered selloff, as buyers accumulate while others fear. ASML's High-NA has started to make inroads into its operating performance, but may take some time ...
When you buy through links on our articles, Future and its syndication partners may earn a commission. Credit: ASML Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results